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ENH: New suite for electrostatic deposition applications

Kutalmış Berçin requested to merge feature-electrodeposition into develop


  • New suite for electrostatic deposition applications
    • Solver function object: electricPotential​: Computes the steady-state equation of charge conservation to obtain the electric potential by strictly assuming a quasi-static electrostatic field for single-phase and multiphase applications.
    • Finite-volume boundary condition: electrostaticDeposition​: A boundary condition to calculate electric potential (V) on a given boundary based on film thickness (h) and film resistance (R) fields which are updated based on a given patch-normal current density field (jn), Coulombic efficiency and film resistivity.
      • Allowing to set:
        • Minimum current density for deposition onset
        • Minimum accumulative specific charge for deposition onset
        • Resistance due to main body and/or pretreatment layers
        • Initial electric potential

Resolved bugs


Details of new models (If applicable)

A showcase illustrating the verification of the electricPotential function object. Right: dielectric-dielectric water-air; left: conductive-dielectric water-air mixture (López-Herrera et al., 2011).


A showcase illustrating the electrostaticDeposition​ BC: pending


  • No changes in existing output.


  • Depletion or abrasion of material due to negative current is not allowed.​
  • Boundary-condition updates are not allowed during outer corrections to prevent spurious accumulation of film thickness.​
  • resistivity, jMin, qMin and Rbody are always non-negative.
  • Quasi steady​
    • No electrolyte/ionic transport​
    • Quiescent​
  • Sufficiently mixed​
  • No magnetic field​
  • No electrolyte and electric field interaction​
  • Isotropic material and electrolyte​
  • No film-flow interactions​
  • No finite-area numerics​

Remaining issues

  • Micro/nano current densities/potential differences cause numerical instabilities.
  • Small diffs in patch-normal current-density values of cathode faces can lead to small diffs in incremental film thickness (Delta_h) on those faces. With the very high value of 'resistivity', the small diffs in 'Delta_h' can then lead to comparable diffs in incremental electric potential differences across patch faces.​
    • These differences can then be accumulated throughout a simulation, causing non-zero potential difference gradients across faces of the cathode.​
    • Our workaround was to round the floating-point numbers of operand variables to a given number of decimal points (default: 8 decimals) - disallow micro/nano volts, so that such accumulation could be avoided.​
    • However, this issue may cause numerical instabilities in more complex cases.​
    • Therefore, the original expressions of the formulation may need to be revisited.​
  • Advanced electrodeposition applications using OpenFOAM can be visited as well:
Edited by Kutalmış Berçin

Merge request reports