ENH: New suite for electrostatic deposition applications
Summary
 New suite for electrostatic deposition applications
 Solver function object:
electricPotential
: Computes the steadystate equation of charge conservation to obtain the electric potential by strictly assuming a quasistatic electrostatic field for singlephase and multiphase applications.  Finitevolume boundary condition:
electrostaticDeposition
: A boundary condition to calculate electric potential (V
) on a given boundary based on film thickness (h
) and film resistance (R
) fields which are updated based on a given patchnormal current density field (jn
), Coulombic efficiency and film resistivity. Allowing to set:
 Minimum current density for deposition onset
 Minimum accumulative specific charge for deposition onset
 Resistance due to main body and/or pretreatment layers
 Initial electric potential
 Allowing to set:
 Solver function object:
Resolved bugs
N/A
Details of new models (If applicable)
A showcase illustrating the verification of the electricPotential
function object. Right: dielectricdielectric waterair; left: conductivedielectric waterair mixture (LópezHerrera et al., 2011).
A showcase illustrating the electrostaticDeposition
BC: pending
Risks
 No changes in existing output.
Constraints
 Depletion or abrasion of material due to negative current is not allowed.
 Boundarycondition updates are not allowed during outer corrections to prevent spurious accumulation of film thickness.

resistivity
,jMin
,qMin
andRbody
are always nonnegative.  Quasi steady
 No electrolyte/ionic transport
 Quiescent
 Sufficiently mixed
 No magnetic field
 No electrolyte and electric field interaction
 Isotropic material and electrolyte
 No filmflow interactions
 No finitearea numerics
Remaining issues
 Micro/nano current densities/potential differences cause numerical instabilities.
 Small diffs in patchnormal currentdensity values of cathode faces can lead to small diffs in incremental film thickness (Delta_h) on those faces. With the very high value of 'resistivity', the small diffs in 'Delta_h' can then lead to comparable diffs in incremental electric potential differences across patch faces.
 These differences can then be accumulated throughout a simulation, causing nonzero potential difference gradients across faces of the cathode.
 Our workaround was to round the floatingpoint numbers of operand variables to a given number of decimal points (default: 8 decimals)  disallow micro/nano volts, so that such accumulation could be avoided.
 However, this issue may cause numerical instabilities in more complex cases.
 Therefore, the original expressions of the formulation may need to be revisited.
 Advanced electrodeposition applications using OpenFOAM can be visited as well:
 Kauffman et al., 2020
 LópezHerrera et al., 2011
 Roghair et al., 2013
 Takayama et al., 2013, Implementation of a Model for Electroplating in OpenFOAM.
 Kashir et al., 2019
 EHDIonFOAM